Immersion specific error contribution to overlay control

Koen D'havé; David Laidler; Shaunee Cheng

doi:10.1117/12.814923

23 March 2009 Immersion specific error contribution to overlay control

Koen D'havé, David Laidler, Shaunee Cheng

Proceedings Volume 7272, Metrology, Inspection, and Process Control for Microlithography XXIII; 72720D (2009) https://doi.org/10.1117/12.814923
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

Ever since the introduction of immersion lithography overlay has been a primary concern. Immersion exposure tools show an overlay fingerprint that we hope to correct for by introducing correctables per field, i.e. a piece-wise approximation of the fingerprint but within the correction capabilities of the exposure tool. If this mechanism is to be used for reducing overlay errors it must be stable over an entire batch. This type of correction requires a substantial amount of measurements therefore it would be ideal if the fingerprint is also stable over time. These requirements are of particular importance for double patterning where overlay budgets have been further reduced. Since the variation of the fingerprint specific to immersion tools creeps directly into the overlay budget, it is important to know how much of the total overlay error can be attributed to changes in the immersion fingerprint. In this paper we estimate this immersion specific error but find it to be a very small contributor.

Citation Download Citation

Koen D'havé, David Laidler, and Shaunee Cheng "Immersion specific error contribution to overlay control", Proc. SPIE 7272, Metrology, Inspection, and Process Control for Microlithography XXIII, 72720D (23 March 2009); https://doi.org/10.1117/12.814923

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