Development of polymers for non-CAR resists for EUV lithography

Andrew K. Whittaker; Idriss Blakey; James Blinco; Kevin S. Jack; Kirsten Lawrie; Heping Liu; Anguang Yu; Michael Leeson; Wang Yeuh; Todd Younkin

doi:10.1117/12.820493

1 April 2009 Development of polymers for non-CAR resists for EUV lithography

Andrew K. Whittaker, Idriss Blakey, James Blinco, Kevin S. Jack, Kirsten Lawrie, Heping Liu, Anguang Yu, Michael Leeson, Wang Yeuh, Todd Younkin

Author Affiliations +

Proceedings Volume 7273, Advances in Resist Materials and Processing Technology XXVI; 727321 (2009) https://doi.org/10.1117/12.820493
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

Three strategies for approaching the design and synthesis of non-chemically amplified resists (non-CARs) are presented. These are linear polycarbonates, star polyester-blk-poly(methyl methacrylate) and comb polymers with polysulfone backbones. The linear polycarbonates were designed to cleave when irradiated with 92 eV photons and high T_g alicyclic groups were incorporated into the backbone to increase T_g and etch resistance. The star block copolymers were designed to have a core that is sensitive to 92 eV photons and arms that have the potential to provide properties such as high T_g and etch resistance. Similarly the polysulfone comb polymers were designed to have an easily degradable polymer backbone and comb-arms that impart favorable physical properties. Initial patterning results are presented for a number of the systems.

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Andrew K. Whittaker, Idriss Blakey, James Blinco, Kevin S. Jack, Kirsten Lawrie, Heping Liu, Anguang Yu, Michael Leeson, Wang Yeuh, and Todd Younkin "Development of polymers for non-CAR resists for EUV lithography", Proc. SPIE 7273, Advances in Resist Materials and Processing Technology XXVI, 727321 (1 April 2009); https://doi.org/10.1117/12.820493

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