Enabling the lithography roadmap: an immersion tool based on a novel stage positioning system

Fred de Jong; Bert van der Pasch; Tom Castenmiller; Bert Vleeming; Richard Droste; Frank van de Mast

doi:10.1117/12.814254

16 March 2009 Enabling the lithography roadmap: an immersion tool based on a novel stage positioning system

Fred de Jong, Bert van der Pasch, Tom Castenmiller, Bert Vleeming, Richard Droste, Frank van de Mast

Proceedings Volume 7274, Optical Microlithography XXII; 72741S (2009) https://doi.org/10.1117/12.814254
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

The lithography roadmap demands overlay reduction along with increased productivity. New applications are proposed as lithography solution for the 32-nm node and possibly beyond. Most of them require very tight overlay and multiple exposures. Major contributors in the overlay budget are coming from the exposure system, like thermal stability, lens aberrations stability, stage positioning and alignment. An additional complexity is the interaction with the actual process and the pattern on the reticle. To keep the lithography roadmap affordable, the cost per wafer needs to be tamed by boosting the productivity of the exposure tool. To enable new applications in a production environment a new generation lithographic exposure tools was developed, with improved overlay and increased productivity. The optical column contains an improved 1.35 NA immersion lens. Compared to the former generation the combination of overlay and productivity requirements are met by a high acceleration wafer stage along with a new stage position measurement system, introducing new technologies paving the way to meet the future roadmap requirements. The increased disturbances caused by the higher accelerations are countered by a short-beam interferometer system thus ensuring optimal positioning performance. Further productivity enhancements are reached by reducing non-exposure time. The latest performance results will be presented; this will include overlay results as well as other critical system performance data.

Citation Download Citation

Fred de Jong, Bert van der Pasch, Tom Castenmiller, Bert Vleeming, Richard Droste, and Frank van de Mast "Enabling the lithography roadmap: an immersion tool based on a novel stage positioning system", Proc. SPIE 7274, Optical Microlithography XXII, 72741S (16 March 2009); https://doi.org/10.1117/12.814254

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available