Morphology, microstructure, stress and damage properties of thin film coatings for the LCLS x-ray mirrors

Regina Soufli; Sherry L. Baker; Jeff C. Robinson; Eric M. Gullikson; Tom J. McCarville; Michael J. Pivovaroff; Peter Stefan; Stefan P. Hau-Riege; Richard Bionta

doi:10.1117/12.823836

18 May 2009 Morphology, microstructure, stress and damage properties of thin film coatings for the LCLS x-ray mirrors

Regina Soufli, Sherry L. Baker, Jeff C. Robinson, Eric M. Gullikson, Tom J. McCarville, Michael J. Pivovaroff, Peter Stefan, Stefan P. Hau-Riege, Richard Bionta

Author Affiliations +

Proceedings Volume 7361, Damage to VUV, EUV, and X-Ray Optics II; 73610U (2009) https://doi.org/10.1117/12.823836
Event: SPIE Optics + Optoelectronics, 2009, Prague, Czech Republic

Abstract

The development and properties of reflective coatings for the x-ray offset mirror systems of the Linac Coherent Light Source (LCLS) free-electron laser (FEL) are discussed in this manuscript. The uniquely high instantaneous dose of the LCLS FEL beam translates to strict limits in terms of materials choice, thus leading to an x-ray mirror design consisting of a reflective coating deposited on a silicon substrate. Coherent wavefront preservation requirements for these mirrors result in stringent surface figure and finish specifications. DC-magnetron sputtered B4C and SiC thin film coatings with optimized stress, roughness and figure properties for the LCLS x-ray mirrors are presented. The evolution of microstructure, morphology, and stress of these thin films versus deposition conditions is discussed. Experimental results on the performance of these coatings with respect to FEL damage are also presented.

Citation Download Citation

Regina Soufli, Sherry L. Baker, Jeff C. Robinson, Eric M. Gullikson, Tom J. McCarville, Michael J. Pivovaroff, Peter Stefan, Stefan P. Hau-Riege, and Richard Bionta "Morphology, microstructure, stress and damage properties of thin film coatings for the LCLS x-ray mirrors", Proc. SPIE 7361, Damage to VUV, EUV, and X-Ray Optics II, 73610U (18 May 2009); https://doi.org/10.1117/12.823836

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