Characterizing the 65nm through-pitch sensitivity to scanner parameters by CD SEM and scatterometry metrologies

Jason Shieh; Alek Chen

doi:10.1117/12.839562

12 December 2009 Characterizing the 65nm through-pitch sensitivity to scanner parameters by CD SEM and scatterometry metrologies

Jason Shieh, Alek Chen

Author Affiliations +

Proceedings Volume 7520, Lithography Asia 2009; 752024 (2009) https://doi.org/10.1117/12.839562
Event: SPIE Lithography Asia, 2009, Taipei, Taiwan

Abstract

Processes of 65nm node are applied on a scanner (TWINSCAN XT1700i) for this experiment. The five adjustable scanner parameters investigated are dose, focus scan range, NA, σ_width, and σ_center of the illumination pupil. The test reticle contains a range of pitches, each with a variety of biases sufficient for selecting the target CD at each pitch. It can be used for exposing patterns for both CD SEM and scatterometry. The minimum and maximum pitches of the 1D line/space pattern are 135 and 500nm, respectively, and no assist feature is added for the isolated pitches. Seventeen pitches are selected for generating the through-pitch curve, and they are the most sensitive ones to this illumination setting. Two metrology tools are used to measure the printed features, i.e. CD SEM and scatterometry. MCD (Middle CD) measured by scatterometry is compared with CD SEM data for the OPE curve. A very consistent offset between two metrologies is presented through the pitches; the R² value is greater than 0.98 for point to point of CD SEM versus MCD correlation. In addition to the CD measurements, scatterometry provides SWA information, which is verified to correlate linearly with focus variations. Based on the metrology data, results of this study demonstrate that the OCD data are as reliable as the CD SEM measurements.

Citation Download Citation

Jason Shieh and Alek Chen "Characterizing the 65nm through-pitch sensitivity to scanner parameters by CD SEM and scatterometry metrologies", Proc. SPIE 7520, Lithography Asia 2009, 752024 (12 December 2009); https://doi.org/10.1117/12.839562

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available