Fabrication of buried-type waveguide with optical gates by nano ion-exchange method

Tetsuji Yano; Eiji Shokatsu; Hiroyo Segawa; Shuichi Shibata

doi:10.1117/12.842868

11 February 2010 Fabrication of buried-type waveguide with optical gates by nano ion-exchange method

Tetsuji Yano, Eiji Shokatsu, Hiroyo Segawa, Shuichi Shibata

Proceedings Volume 7604, Integrated Optics: Devices, Materials, and Technologies XIV; 76040X (2010) https://doi.org/10.1117/12.842868
Event: SPIE OPTO, 2010, San Francisco, California, United States

Abstract

Buried-type optical waveguide with blanches for the gate of optical signals was fabricated by nano ion-exchange method using the probe of atomic force microscope (AFM) as an electrode. 2-step procedure of the electric field-assisted Ag/Na-ion exchange followed by K/Na one was applied to prepare the waveguide structure inside the glass substrate. Pt-coated AFM probe as a cathode was attached to the glass surface and Ag⁺ ions in the core underneath the probe were partially extracted towards the glass surface. The protruding high index regions from the core towards the glass surface were found to work as the optical gate where the wavelength and intensity of light through the gate was determined by the condition of nano ion-exchange treatment.

Citation Download Citation

Tetsuji Yano, Eiji Shokatsu, Hiroyo Segawa, and Shuichi Shibata "Fabrication of buried-type waveguide with optical gates by nano ion-exchange method", Proc. SPIE 7604, Integrated Optics: Devices, Materials, and Technologies XIV, 76040X (11 February 2010); https://doi.org/10.1117/12.842868

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