Polycarbonate based nonchemically amplified photoresists for extreme ultraviolet lithography

Idriss Blakey; Anguang Yu; James Blinco; Kevin S. Jack; Heping Liu; Michael Leeson; Wang Yueh; Todd Younkin; Andrew K. Whittaker

doi:10.1117/12.853620

22 March 2010 Polycarbonate based nonchemically amplified photoresists for extreme ultraviolet lithography

Idriss Blakey, Anguang Yu, James Blinco, Kevin S. Jack, Heping Liu, Michael Leeson, Wang Yueh, Todd Younkin, Andrew K. Whittaker

Author Affiliations +

Proceedings Volume 7636, Extreme Ultraviolet (EUV) Lithography; 763635 (2010) https://doi.org/10.1117/12.853620
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

Some initial EUVL patterning results for polycarbonate based non-chemically amplified resists are presented. Without full optimization the developer a resolution of 60 nm line spaces could be obtained. With slight overexposure (1.4 × E₀) 43.5 nm lines at a half pitch of 50 nm could be printed. At 2x E₀ a 28.6 nm lines at a half pitch of 50 nm could be obtained with a LER that was just above expected for mask roughness. Upon being irradiated with EUV photons, these polymers undergo chain scission with the loss of carbon dioxide and carbon monoxide. The remaining photoproducts appear to be non-volatile under standard EUV irradiation conditions, but do exhibit increased solubility in developer compared to the unirradiated polymer. The sensitivity of the polymers to EUV light is related to their oxygen content and ways to increase the sensitivity of the polymers to 10 mJ cm^-2 is discussed.

Citation Download Citation

Idriss Blakey, Anguang Yu, James Blinco, Kevin S. Jack, Heping Liu, Michael Leeson, Wang Yueh, Todd Younkin, and Andrew K. Whittaker "Polycarbonate based nonchemically amplified photoresists for extreme ultraviolet lithography", Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 763635 (22 March 2010); https://doi.org/10.1117/12.853620

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available