Advances in roll-to-roll imprint lithography for display applications

Albert Jeans; Marcia Almanza-Workman; Robert Cobene; Richard Elder; Robert Garcia; Fernando Gomez-Pancorbo; Warren Jackson; Mehrban Jam; Han-Jun Kim; Ohseung Kwon; Hao Luo; John Maltabes; Ping Mei; Craig Perlov; Mark Smith; Carl Taussig; Frank Jeffrey; Steve Braymen; Jason Hauschildt; Kelly Junge; Don Larson; Dan Stieler

doi:10.1117/12.852268

2 April 2010 Advances in roll-to-roll imprint lithography for display applications

Albert Jeans, Marcia Almanza-Workman, Robert Cobene, Richard Elder, Robert Garcia, Fernando Gomez-Pancorbo, Warren Jackson, Mehrban Jam, Han-Jun Kim, Ohseung Kwon, Hao Luo, John Maltabes, Ping Mei, Craig Perlov, Mark Smith, Carl Taussig, Frank Jeffrey, Steve Braymen, Jason Hauschildt, Kelly Junge, Don Larson, Dan Stieler

Author Affiliations +

Proceedings Volume 7637, Alternative Lithographic Technologies II; 763719 (2010) https://doi.org/10.1117/12.852268
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

A solution to the problems of roll-to-roll lithography on flexible substrates is presented. We have developed a roll-toroll imprint lithography technique to fabricate active matrix transistor backplanes on flexible webs of polyimide that have a blanket material stack of metals, dielectrics, and semiconductors. Imprint lithography produces a multi-level 3- dimensional mask that is then successively etched to pattern the underlying layers into the desired structures. This process, Self-Aligned Imprint Lithography (SAIL), solves the layer-to-layer alignment problem because all masking levels are created with one imprint step. The processes and equipment required for complete roll-to-roll SAIL fabrication will be described. Emphasis will be placed on the advances in the roll-to-roll imprint process which have enabled us to produce working transistor arrays.

Citation Download Citation

Albert Jeans, Marcia Almanza-Workman, Robert Cobene, Richard Elder, Robert Garcia, Fernando Gomez-Pancorbo, Warren Jackson, Mehrban Jam, Han-Jun Kim, Ohseung Kwon, Hao Luo, John Maltabes, Ping Mei, Craig Perlov, Mark Smith, Carl Taussig, Frank Jeffrey, Steve Braymen, Jason Hauschildt, Kelly Junge, Don Larson, and Dan Stieler "Advances in roll-to-roll imprint lithography for display applications", Proc. SPIE 7637, Alternative Lithographic Technologies II, 763719 (2 April 2010); https://doi.org/10.1117/12.852268

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available