Mask shop automation: station controllers for photomask manufacturing

Derek Lager; Venkatesh Nadamuni

doi:10.1117/12.867687

24 September 2010 Mask shop automation: station controllers for photomask manufacturing

Derek Lager, Venkatesh Nadamuni

Proceedings Volume 7823, Photomask Technology 2010; 78231X (2010) https://doi.org/10.1117/12.867687
Event: SPIE Photomask Technology, 2010, Monterey, California, United States

Abstract

Station Controllers have existed in Wafer FABs for well over a decade now. Until recently, relatively low volume of masks produced did not justify the added cost of enabling SECS/GEM on the tools and implementing full automation. Starting with a drive to improve yield and the need for advanced capabilities such as Excursion Protection, a combination of recent factors has driven the need for greater automation. This paper will discuss key capabilities, architectural highlights and strategies in implementation. In addition we will discuss the challenges faced and key learning in development and validation of the station controllers in a full production environment with minimum impact or interruption to the processing of WIP.

Citation Download Citation

Derek Lager and Venkatesh Nadamuni "Mask shop automation: station controllers for photomask manufacturing", Proc. SPIE 7823, Photomask Technology 2010, 78231X (24 September 2010); https://doi.org/10.1117/12.867687

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