Minienvironment solutions: special concepts for mask-systems

M. Dobler; M. Rüb; T. Billen

doi:10.1117/12.895200

1 April 2011 Minienvironment solutions: special concepts for mask-systems

M. Dobler, M. Rüb, T. Billen

Proceedings Volume 7985, 27th European Mask and Lithography Conference; 79850Q (2011) https://doi.org/10.1117/12.895200
Event: 27th European Mask and Lithography Conference, 2011, Dresden, Germany

Abstract

Cleanroom technology is a principle pre-condition and the enabling technology for contamination free manufacturing. With the transition from large cleanroom facilities for semiconductor manufacturing to localized encapsulated cleanroom solutions which are called minienvironments the traditional cleanroom technology is extended into a new field of applications. With view to the highest requirements in semiconductor industries and especially in the mask area, extraordinary concepts and solutions has to be developed and applied. In this contribution the fundamental considerations about the different concepts for minienvironments are outlined and reviewed. A set of various parameters involved in a design process for a state of the art minienvironment are given and discussed in detail. The resulting different concepts are presented and the strength of each concept is discussed. The resulting minienvironment solutions are demonstrated on three characteristic examples and options, alternatives and the advantages of the individual concepts are mentioned. Based on the current status of minienvironment technology an out-look is given about future challenges and open questions to be solved.

Citation Download Citation

M. Dobler, M. Rüb, and T. Billen "Minienvironment solutions: special concepts for mask-systems", Proc. SPIE 7985, 27th European Mask and Lithography Conference, 79850Q (1 April 2011); https://doi.org/10.1117/12.895200

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