A solid immersion interference lithography system for imaging ultra-high numerical apertures with high-aspect ratios in photoresist using resonant enhancement from effective gain media

Prateek Mehrotra; Chris A. Mack; Richard J. Blaikie

doi:10.1117/12.916295

13 March 2012 A solid immersion interference lithography system for imaging ultra-high numerical apertures with high-aspect ratios in photoresist using resonant enhancement from effective gain media

Prateek Mehrotra, Chris A. Mack, Richard J. Blaikie

Author Affiliations +

Proceedings Volume 8326, Optical Microlithography XXV; 83260Z (2012) https://doi.org/10.1117/12.916295
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

In the last year our Solid Immersion Lloyd's Mirror Interference Lithography (SILMIL) system has proved to be a successful tool for evanescent interferometric lithography (EIL). The initial goal was to use SILMIL in conjunction with the surface plasmon polariton (SPP) surface states at the resist-metal interface. Through this resonance, we aimed to counter the decay of evanescent images created using EIL. By analyzing the theory in greater detail we were able to develop a better understanding of the resonance phenomena. In this paper, details of the design of SILMIL and how one may utilize it to produce ultra-high numerical apertures (NAs) are given, as well as an introduction to the resonance phenomena and the mechanism behind it. We introduce a new method that requires a gain medium (one that has a negative loss) to achieve significant enhancements, and present an effective gain medium by using a high-index dielectric on low-index media. We present results at λ = 405 nm using such an effective gain medium and also provide a feasible design example at the lithography standard λ = 193 nm.

Citation Download Citation

Prateek Mehrotra, Chris A. Mack, and Richard J. Blaikie "A solid immersion interference lithography system for imaging ultra-high numerical apertures with high-aspect ratios in photoresist using resonant enhancement from effective gain media", Proc. SPIE 8326, Optical Microlithography XXV, 83260Z (13 March 2012); https://doi.org/10.1117/12.916295

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