Studying the effects of modified surface chemistry on chrome migration in binary photomasks

Christopher Kossow; Peter Kirlin; Michael Green

doi:10.1117/12.2025172

9 September 2013 Studying the effects of modified surface chemistry on chrome migration in binary photomasks

Christopher Kossow, Peter Kirlin, Michael Green

Proceedings Volume 8880, Photomask Technology 2013; 88800Z (2013) https://doi.org/10.1117/12.2025172
Event: SPIE Photomask Technology, 2013, Monterey, California, United States

Abstract

Migration of the Cr/Cr_xO_y film in binary photomasks during use in 193nm photolithography has been observed for some time in the semiconductor industry. This phenomenon leads to a shift in the reticle critical dimensions (CDs) that worsen with increased exposure eventually resulting in wafer yield loss. This paper studies the impact of varying annealing conditions on the Cr_xO_y species on the surface of the mask. Further, we examined the effect of a surface condition with maximized Cr₂O₃ content on the 193nm-induced chrome migration phenomenon. Scanning Electron Microscopy (SEM), Transmission Electron Microscopy (TEM), and X-Ray Photoelectron Spectroscopy (XPS) were used to characterize the composition of the Cr/Cr_xO_y film. A 193nm accelerated exposure test bench was used to induce film migration in samples of varying surface chemistry.

Citation Download Citation

Christopher Kossow, Peter Kirlin, and Michael Green "Studying the effects of modified surface chemistry on chrome migration in binary photomasks", Proc. SPIE 8880, Photomask Technology 2013, 88800Z (9 September 2013); https://doi.org/10.1117/12.2025172

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