2013 Photomask Japan panel discussion summary: Future mask patterning technologies in the next decade: searching for the best mix solution

Noriaki Nakayamada; Ichiro Kagami

doi:10.1117/12.2032072

9 September 2013 2013 Photomask Japan panel discussion summary: Future mask patterning technologies in the next decade: searching for the best mix solution

Noriaki Nakayamada, Ichiro Kagami

Author Affiliations +

Proceedings Volume 8880, Photomask Technology 2013; 888015 (2013) https://doi.org/10.1117/12.2032072
Event: SPIE Photomask Technology, 2013, Monterey, California, United States

Abstract

This paper gives a review and summary of the key messages from the 2013 PMJ panel discussion topic: “Future mask patterning technologies in the next decade: searching for the best mix solution." The results of the special survey conducted for the panel are reviewed along with a brief summary of each panelist’s point of view.

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Noriaki Nakayamada and Ichiro Kagami "2013 Photomask Japan panel discussion summary: Future mask patterning technologies in the next decade: searching for the best mix solution", Proc. SPIE 8880, Photomask Technology 2013, 888015 (9 September 2013); https://doi.org/10.1117/12.2032072

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