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The papers included in this volume were part of the technical conference cited on the cover and title page. Papers were selected and subject to review by the editors and conference program committee. Some conference presentations may not be available for publication. The papers published in these proceedings reflect the work and thoughts of the authors and are published herein as submitted. The publisher is not responsible for the validity of the information or for any outcomes resulting from reliance thereon. Please use the following format to cite material from this book: Author(s), “Title of Paper,” in 30th European Mask and Lithography Conference, edited by Uwe F.W. Behringer, Proceedings of SPIE Vol. 9231 (SPIE, Bellingham, WA, 2014) Article CID Number. ISSN: 0277-786X ISBN: 9781628412857 Published by SPIE P.O. Box 10, Bellingham, Washington 98227-0010 USA Telephone +1 360 676 3290 (Pacific Time) · Fax +1 360 647 1445 SPIE.org Copyright © 2014, Society of Photo-Optical Instrumentation Engineers. Copying of material in this book for internal or personal use, or for the internal or personal use of specific clients, beyond the fair use provisions granted by the U.S. Copyright Law is authorized by SPIE subject to payment of copying fees. The Transactional Reporting Service base fee for this volume is $18.00 per article (or portion thereof), which should be paid directly to the Copyright Clearance Center (CCC), 222 Rosewood Drive, Danvers, MA 01923. Payment may also be made electronically through CCC Online at copyright.com. Other copying for republication, resale, advertising or promotion, or any form of systematic or multiple reproduction of any material in this book is prohibited except with permission in writing from the publisher. The CCC fee code is 0277-786X/14/$18.00. Printed in the United States of America. Publication of record for individual papers is online in the SPIE Digital Library. Paper Numbering: Proceedings of SPIE follow an e-First publication model, with papers published first online and then in print and on CD-ROM. Papers are published as they are submitted and meet publication criteria. A unique, consistent, permanent citation identifier (CID) number is assigned to each article at the time of the first publication. Utilization of CIDs allows articles to be fully citable as soon as they are published online, and connects the same identifier to all online, print, and electronic versions of the publication. SPIE uses a six-digit CID article numbering system in which:
The CID Number appears on each page of the manuscript. The complete citation is used on the first page, and an abbreviated version on subsequent pages. Numbers in the index correspond to the last two digits of the six-digit CID Number. AuthorsNumbers in the index correspond to the last two digits of the six-digit citation identifier (CID) article numbering system used in Proceedings of SPIE. The first four digits reflect the volume number. Base 36 numbering is employed for the last two digits and indicates the order of articles within the volume. Numbers start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B&0Z, followed by 10-1Z, 20-2Z, etc. Ackmann, Paul W., 06, 0I Adam, Kostas, 0I Armeanu, Ana, 0I Banasch, Michael, 0E Behrendt, U., 0P Bekaert, Joost, 0R, 0T Belledent, Jérôme, 0Q Beraud, B., 0V Bischoff, J., 0L Bodermann, B., 0M Bouma, Anita, 0S Buck, Peter, 0I Buergel, Christian, 0I Burger, S., 0M Cao, Yi, 0R Capelli, Renzo, 09 Chan, Boon Teik, 0R Choi, Kang-Hoon, 0F Clifford, Chris, 0I Connolly, Brid, 02 Cotte, Eric, 0O Crowcombe, W. E., 0B Cuypers, Dieter, 0H Davydova, Natalia, 02, 08 Decaunes, J., 0V de Kruif, Robert, 02 Depre, Laurent, 08 De Smet, Herbert, 0H De Smet, Jelle, 0H Dietrich, Kay, 0E Dirnstorfer, I., 0L Doise, Jan, 0R Ducotè, J., 0V Endres, J., 0M Esche, Silvio, 0U Falkner, Matthias, 0E Farys, Vincent, 08 Fenger, Germain, 0Q, 0T Finders, Jo, 08, 0S Fouquet, Antoine, 0Q Fryer, David, 0I Fukugami, Norihito, 02 Gans, Fritz, 0I Garetto, Anthony, 09 Gatefait, M., 0V Gharbi, Ahmed, 0Q Granik, Yuri, 0Q, 0T Gronheid, Roel, 0R Gutsch, Manuela, 0F Haase, A., 0M Hagihara, Kazuki, xvii Hanisch, Norbert, 0F Hasan, Md. Nazmul, 0J Hattori, Kiyoshi, 07 Heinrich, A., 0L Her, YoungJun, 0R Herfst, R. W., 0B Hertzsch, Tino, 0O Hohle, Christoph, 0F, 0U Huebner, Uwe, 0E Imoto, Tomohiro, 02 Islamaj, Esma, 0H Itoh, Masamitsu, xvii Jaganatharaja, Ramasubramanian Kottumakulal, 02 Joshi, Pankaj, 0H Kalk, Franklin, 0I Kamikubo, Takashi, 07 Kaynak, M., 0P Ketelsen, H., 0L Kley, Ernst-Bernhard, 0E Kobayashi, Yoshihito, xvii Kodera, Yutaka, 02 Kondo, Shinpei, 02 Kotani, Jun, 02 Kramer, G. F. I. J., 0B Krasnova, Polina, 0Q Krumrey, M., 0M Kulse, P., 0P Lam, A., 0V Lam, Michael, 0I Lammers, Ad, 02 Lapeyre, C., 0V Laubis, C., 0M Le-Gratiet, B., 0V Litt, Lloyd C., 06 Ma, Yuansheng, 0Q, 0T Magnusson, Krister, 09 Man, Cheuk-Wah, 02 Marschmeyer, S., 0P Meiner, K., 0L Mikolajczak, M., 0V Mikolajick, T., 0L Miyazaki, Junji, 0S Morimoto, Hiroaki, 02 Motokawa, Takeharu, xvii Murugesan Kuppuswamy, Vijaya-Kumar, 0R Nakagawa, Kent, 0I Ning, Guo Xiang, 06, 0I Ogasawara, Munehiro, 07 Oliver, Mike, 0I Oorschot, Dorothe, 02, 08 Orlando, B., 0V Ostrovsky, A., 0V Pelletier, A., 0V Psara, Eleni, 08 Rahman, Md. Momtazur, 0J Richter, U., 0L Rolff, Haiko, 02 Rudolph, Matthias, 0U Ruhm, Matthias, 0O Ryckaert, Julien, 0T Sadeghian, H., 0B Saito, Masato, xvii Sakata, Yo, 02 Scherübl, Thomas, 09 Schiffelers, Guido, 02, 08 Scholze, F., 0M Schulz, Bernd, 0O Schulz, K., 0P Schulze, Steffen, 0I Schumann, Dirk, 0U Seidel, Robert, 0F Seltmann, Rolf, 04, 0O Shang, Xiaobing, 0H Soltwisch, V., 0M Steidel, Katja, 0F Sturtevant, John, 0I Suenaga, Machiko, xvii Sundermann, F., 0V Takekoshi, Hidekazu, 07 Tan, Jin-Yi, 0H Tejnil, Edita, 0I Thienpont, Hugo, 0H Thrun, Xaver, 0F, 0U Tillack, B., 0P Tiron, Raluca, 0Q Torres, J. Andres, 0Q, 0T Udoy, Ariful Banna, 0J Ugajin, Kunihiro, xvii Ullrich, Albrecht, 02, 0M Utsumi, Takao, 0D Vandenberghe, Geert, 0R, 0T van den Dool, T. C., 0B van Dijk, Joep, 02 Van Erps, Jurgen, 0H van Setten, Eelco, 02, 08 van Veen, Marieke, 0S Vervaeke, Michael, 0H Wernecke, J., 0M Werner, Thomas, 0F Wietstruck, M., 0P Winters, J., 0B Word, James, 0T Wurm, S., 03 Yagawa, Keisuke, xvii Yamada, Hirokazu, 07 Zeitner, Uwe D., 0E Conference CommitteeConference Chair Conference Co-chairs
Program Chairs
Members
Session Chairs
ForewordOn behalf of VDE/VDI-GMM, the sponsors, and the organizing committee, we welcome you to the proceedings volume from the 30th European Mask and Lithography Conference, EMLC2014 at the Hilton Hotel in Dresden, Germany. The conference has annually brought together scientists, researchers, engineers, and technologists from research institutes and companies from around the world to present innovations at the forefront of mask lithography and mask technology. The two-day conference was dedicated to the science, technology, engineering, and application of mask and lithography technologies and associated processes, giving an overview of the present status in mask and lithography technologies and the future strategy where mask producers and users have the opportunity of becoming acquainted with new developments and results. This year’s sessions included: Mask Writing Time Optimization; EUV Lithography; EUV Mask Technology; E-Beam Technologies; Templates Technologies; Simulation; Metrology; Wafer Processing; DSA Technology and Alternative Lithography, and Processes and Special Technologies. Heinz Martin Esser, CEO of Roth & Rau – Ortner GmbH was the welcome speaker. His presentation introduced European’s largest Cluster in the ICT (Information & Communication Technology) and explained the impressive development with the main success factors. Another highlight of his talk described the efforts to build up a strong European Cooperation beginning initially with a partnership with Grenobles (Minalogic) which could be extended with other important European High-Tech Clusters (Silicon Europa) to establish a new mutual European Identity in the global competition. Our first keynote speaker was Jan Hendrik Peters from Carl Zeiss, SMS GmbH, Jena, Germany. His talk was “EUV mask infrastructure: Are we ready to meet the demands for the consumer electronics market?” Our second keynote speaker was Stefan Wurm from SEMATECH. His talk was entitled “EUV lithography: process, challenges and outlook.” Keeping our tradition, we invited the Best Paper of PMJ 2014 (the paper will be announced by the PMJ Committee), and the Best Poster from BACUS2013 which was “Black border, mask 3D effects: covering challenges of EUV mask architecture for 22nm node and beyond,” and was presented by Natalia Davydova from ASML. Also a tradition we invited V. Jindal from SEMATECH to present information regarding the yearly “Mask Industry Survey.” Technical ExhibitionParallel to the Conference Presentations, the Technical Exhibition took place on Tuesday and Wednesday where companies (mask suppliers, material suppliers, and equipment suppliers) exhibited their companies and products. To foster the exchange between the conference attendees and the exhibitors, the exhibition area was also the place for all coffee and lunch breaks. Uwe F.W. Behringer EMLC2014 Conference Chair |