Paper
31 October 2014 Study of laser-induced fatigue effects in synthetic fused silica in the UV
Author Affiliations +
Abstract
In the last decades, the resistance to high-power laser flux was largely improved in most of optical components insofar as 1-on-1 measurements are concerned. Another challenge lies in improving their resistance to multiple laser shots for highpower laser applications. Indeed, in multi-pulse irradiation, a decrease of the laser-induced damage threshold with increasing number of pulse was observed in various optical materials as in glasses, crystals, and thin-films. This effect, commonly denominated "fatigue" effect, is a limiting factor in many applications where optics have to be long-lifetime, as for example for space applications. Representing the laser damage probability as a function of pulse number for a given fluence allows to distinguish statistical pseudo-fatigue and fatigue which is due to cumulative material modifications. Investigating on the fatigue effects in the bulk of synthetic fused silica (Suprasil 1®) for different wavelengths, we evidenced that the fatigue effect was due to statistical pseudo-fatigue when irradiated at 1064 nm while the fatigue effect at 355 nm came from cumulative material modifications. The current work is dedicated a more detailed study of fatigue effects in Suprasil 1®, testing the influence of the beam size on the fatigue effects. Moreover, an estimation of the lifetime of the created defects is performed using a destructive technique.
© (2014) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
C. Gouldieff, F. R. Wagner, and J.-Y. Natoli "Study of laser-induced fatigue effects in synthetic fused silica in the UV", Proc. SPIE 9237, Laser-Induced Damage in Optical Materials: 2014, 923725 (31 October 2014); https://doi.org/10.1117/12.2069658
Lens.org Logo
CITATIONS
Cited by 1 scholarly publication.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Silica

Ultraviolet radiation

Laser damage threshold

Laser induced damage

Laser applications

Neodymium

Resistance

Back to Top