Integrating optical fabrication and metrology into the optical design process

James E. Harvey

doi:10.1117/12.2075363

17 December 2014 Integrating optical fabrication and metrology into the optical design process

James E. Harvey

Proceedings Volume 9293, International Optical Design Conference 2014; 929328 (2014) https://doi.org/10.1117/12.2075363
Event: International Optical Design Conference, 2014, Kohala Coast, Hawaii, United States

Abstract

Image degradation due to scattered radiation from residual optical fabrication errors is a serious problem in many short wavelength (X-ray/EUV) imaging systems. Most commercially-available image analysis codes (ZEMAX, Code V, ASAP, FRED, etc.) currently require the scatter behavior (BSDF data) to be provided as input in order to calculate the image quality of such systems. This BSDF data is difficult to measure and rarely available for the operational wavelengths of interest. Since the smooth-surface approximation is often not satisfied at these short wavelengths, the classical Rayleigh-Rice expression that indicates the BRDF is directly proportional to the surface PSD cannot be used to calculate BRDFs from surface metrology data for even slightly rough surfaces. However, an FFTLog numerical Hankel transform algorithm enables the practical use of the computationally intensive Generalized Harvey-Shack (GHS) surface scatter theory [1] to calculate BRDFs from surface PSDs for increasingly short wavelengths that violate the smooth surface approximation implicit in the Rayleigh-Rice surface scatter theory [2-3]. The recent numerical validation [4] of the GHS theory (a generalized linear systems formulation of surface scatter theory), and an analysis of image degradation due to surface scatter in the presence of aberrations [5] has provided credence to the development of a systems engineering analysis of image quality as degraded not only by diffraction effects and geometrical aberrations, but to scattering effects due to residual optical fabrication errors as well. These advances, combined with the continuing increase in computer speed, leave us poised to fully integrate optical metrology and fabrication into the optical design process.

Citation Download Citation

James E. Harvey "Integrating optical fabrication and metrology into the optical design process", Proc. SPIE 9293, International Optical Design Conference 2014, 929328 (17 December 2014); https://doi.org/10.1117/12.2075363

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available