Paper
13 March 2015 Electrochromism: from oxide thin films to devices
A. Rougier, A. Danine, C. Faure, S. Buffière
Author Affiliations +
Proceedings Volume 9364, Oxide-based Materials and Devices VI; 93641D (2015) https://doi.org/10.1117/12.2077577
Event: SPIE OPTO, 2015, San Francisco, California, United States
Abstract
In respect of their adaptability and performance, electrochromic devices, ECDs, which are able to change their optical properties under an applied voltage, have received significant attention. Target applications are multifold both in the visible region (automotive sunroofs, smart windows, ophthalmic lenses, and domestic appliances (oven, fridge…)) and in the infrared region (Satellites Thermal Control, IR furtivity). In our group, focusing on oxide thin films grown preferentially at room temperature, optimization of ECDs performances have been achieved by tuning the microstructure, the stoichiometry and the cationic composition of the various layers. Herein, our approach for optimized ECDs is illustrated through the example of WO3 electrochromic layer in the visible and in the IR domain as well as ZnO based transparent conducting oxide layer. Targeting the field of printed electronics, simplification of the device architecture for low power ECDs is also reported.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
A. Rougier, A. Danine, C. Faure, and S. Buffière "Electrochromism: from oxide thin films to devices", Proc. SPIE 9364, Oxide-based Materials and Devices VI, 93641D (13 March 2015); https://doi.org/10.1117/12.2077577
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KEYWORDS
Thin films

Reflectivity

Oxides

Thin film devices

Silicon

Medium wave

Thin film deposition

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