193i lithography for contact doubling with grapho-epitaxy DSA: a simulation study

A. Fouquet; L. Perraud; S. Bérard-Bergery; A. Gharbi; P. Pimenta-Barros; R. Tiron; J. Hazart; V. Farys

doi:10.1117/12.2085822

27 March 2015 193i lithography for contact doubling with grapho-epitaxy DSA: a simulation study

A. Fouquet, L. Perraud, S. Bérard-Bergery, A. Gharbi, P. Pimenta-Barros, R. Tiron, J. Hazart, V. Farys

Proceedings Volume 9423, Alternative Lithographic Technologies VII; 942324 (2015) https://doi.org/10.1117/12.2085822
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

Directed self-assembly (DSA) of block copolymers (BCP) is a promising candidate for alternative micro lithography due to its cost effectiveness, its ability to reduce critical dimension and to increase pattern density. For contact layer patterning, grapho-epitaxy combined with cylindrical BCP is a good candidate. While contact shrink has already been a well-controlled process, contact multiplication is still undergoing further studies. In this paper we propose to study the impact of 193i scanner variations on BCP overlay for contact doubling.

Citation Download Citation

A. Fouquet, L. Perraud, S. Bérard-Bergery, A. Gharbi, P. Pimenta-Barros, R. Tiron, J. Hazart, and V. Farys "193i lithography for contact doubling with grapho-epitaxy DSA: a simulation study", Proc. SPIE 9423, Alternative Lithographic Technologies VII, 942324 (27 March 2015); https://doi.org/10.1117/12.2085822

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