Quantitative nanomechanical measurement of electron beam surface modification

Aaron Cordes; Benjamin Bunday; Cecilia Montgomery; Jason Osborne; Sean Hand

doi:10.1117/12.2190984

10 April 2015 Quantitative nanomechanical measurement of electron beam surface modification

Aaron Cordes, Benjamin Bunday, Cecilia Montgomery, Jason Osborne, Sean Hand

Proceedings Volume 9424, Metrology, Inspection, and Process Control for Microlithography XXIX; 94242R (2015) https://doi.org/10.1117/12.2190984
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

Electron beam induced surface damage in general, and resist shrinkage in particular, are serious issues in any form of electron beam based metrology. Previous studies investigated dimensional changes that occur in resists that were exposed to electron beams. This work builds on these previous studies to consider changes to the material properties of the exposed resists and other materials using quantitative nano-mechanical mapping scanning probe microscopy. Initial data has shown clearly that there are measurable material differences between pre- and post-electron beam exposure. To study this change iArF photo-resists are exposed to varying electron beam energies and doses. These regions are then measured via SPM for dimensional and material property changes. These changes in the exposed areas are correlated to those predicted by modeled results.

Citation Download Citation

Aaron Cordes, Benjamin Bunday, Cecilia Montgomery, Jason Osborne, and Sean Hand "Quantitative nanomechanical measurement of electron beam surface modification", Proc. SPIE 9424, Metrology, Inspection, and Process Control for Microlithography XXIX, 94242R (10 April 2015); https://doi.org/10.1117/12.2190984

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