Modification of cantilevers for atomic-force microscopy using the method of exposure defocused ion beam

S. P. Antonov; S. Yu. Krasnoborodko; S. A. Smagulova; Y. A. Chaplygin; V. I. Shevyakov

doi:10.1117/12.2179243

18 December 2014 Modification of cantilevers for atomic-force microscopy using the method of exposure defocused ion beam

S. P. Antonov, S. Yu. Krasnoborodko, S. A. Smagulova, Y. A. Chaplygin, V. I. Shevyakov

Author Affiliations +

Proceedings Volume 9440, International Conference on Micro- and Nano-Electronics 2014; 94400O (2014) https://doi.org/10.1117/12.2179243
Event: The International Conference on Micro- and Nano-Electronics 2014, 2014, Zvenigorod, Russian Federation

Abstract

This work is focused on investigation of the tips sharpening process with the use of defocused ion beam. The group of cantilevers was placed on silicon substrate. It was established that the method enables the simultaneous sharpening of silicon cantilevers tips placed on 200-mm diameter Si substrates. The current work provides information about efficiency of the modified cantilevers.

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S. P. Antonov, S. Yu. Krasnoborodko, S. A. Smagulova, Y. A. Chaplygin, and V. I. Shevyakov "Modification of cantilevers for atomic-force microscopy using the method of exposure defocused ion beam", Proc. SPIE 9440, International Conference on Micro- and Nano-Electronics 2014, 94400O (18 December 2014); https://doi.org/10.1117/12.2179243

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