This paper will present a novel methodology to enumerate initial test patterns based on other technology node products. With this novel methodology, DRM development and process capability verification can be sped up rapidly in comparison to a more traditional way. At the same time, the process weak-point signatures can be migrated from the older technology nodes to the new technology node for verification. This methodology will help foundries catch process detractor patterns at new technology early development stage. |
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Acquisition tracking and pointing
Databases
Electronic design automation
Manufacturing
Profiling
Structural design
Image classification