Integrated Optical Devices Based On Silica Waveguide Technologies

T. Miyashita; S. Sumida; S. Sakaguchi

doi:10.1117/12.960102

6 December 1988 Integrated Optical Devices Based On Silica Waveguide Technologies

T. Miyashita, S. Sumida, S. Sakaguchi

Proceedings Volume 0993, Integrated Optical Circuit Engineering VI; (1988) https://doi.org/10.1117/12.960102
Event: O-E/Fiber LASE '88, 1988, Boston, MA, United States

Abstract

A wide variety of integrated optical devices was developed based on silica glass waveguide technologies. High performance waveguide with low loss and well-controlled configuration is formed on silicon substrate by a combination of flame hydrolysis deposition, photolithographic and reactive ion etching processes. This waveguide technology also has the great advantage of guiding groove structure for hybridizing optical fibers and chips onto the waveguide. Based on this silica glass waveguide technology, several types of integrated optical devices such as branching, WDM, polarization control, resonance and switching devices have been constructed and tested.

Citation Download Citation

T. Miyashita, S. Sumida, and S. Sakaguchi "Integrated Optical Devices Based On Silica Waveguide Technologies", Proc. SPIE 0993, Integrated Optical Circuit Engineering VI, (6 December 1988); https://doi.org/10.1117/12.960102

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