Development of a novel closed EUV pellicle for EUVL manufacturing

Yosuke Ono; Kazuo Kohmura; Atsushi Okubo; Daiki Taneichi; Hisako Ishikawa; Tsuneaki Biyajima

doi:10.1117/12.2241393

26 September 2016 Development of a novel closed EUV pellicle for EUVL manufacturing

Yosuke Ono, Kazuo Kohmura, Atsushi Okubo, Daiki Taneichi, Hisako Ishikawa, Tsuneaki Biyajima

Proceedings Volume 9985, Photomask Technology 2016; 99850B (2016) https://doi.org/10.1117/12.2241393
Event: SPIE Photomask Technology, 2016, San Jose, California, United States

Abstract

As for the EUV pellicle, closed pellicle structure with the filters which has fundamentally no penetration path of particles is needed to keep the clean reliability level of photomask equivalent to the current photolithography. We proposed a novel closed EUV pellicle equipped with filters which has not only the particle intrusion prevention but also the ventilation performance. Full-size closed EUV pellicle was fabricated by forming the vent holes in the Si border part and putting the wide filters on the top side of Si border. As the result, we experimentally confirmed the suppression of the membrane deflection under the practical pumping down condition.

Citation Download Citation

Yosuke Ono, Kazuo Kohmura, Atsushi Okubo, Daiki Taneichi, Hisako Ishikawa, and Tsuneaki Biyajima "Development of a novel closed EUV pellicle for EUVL manufacturing", Proc. SPIE 9985, Photomask Technology 2016, 99850B (26 September 2016); https://doi.org/10.1117/12.2241393

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