Presentation
5 October 2023 Perspectives of design, materials, and fabrication for metasurfaces
Author Affiliations +
Abstract
We represent AI-designed metasurfaces and three low-cost manufacturing: 1) nanoimprinting with high-refractive-index dielectric particle embedding resin (PER), 2) bandgap engineering of hydrogenated amorphous silicon (a-Si:H), and 3) atomic-layer coating on imprinted resin. a-Si, TiO2, and ZrO2 PERs are used for metasurfaces at infrared (940 nm), visible (532 nm), and ultraviolet (325 and 248 nm), respectively; measured efficiencies reach 47% (940 nm), 91% (532 nm), 72% (325 nm), and 49% (248 nm). PER metasurfaces with an inverse design provide 3D, full-color holography at visible. The bandgap of a-Si:H is engineered to suppress optical losses, realizing metasurface efficiencies of 42% (450 nm), 65% (532 nm), and 75% (635 nm)[6]. We deposit an atomic layer on resin for 12-inch metasurfaces, achieving measured efficiencies of 61% (450 nm), 78% (532 nm), and 65% (635 nm).
Conference Presentation
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Junsuk Rho "Perspectives of design, materials, and fabrication for metasurfaces", Proc. SPIE PC12648, Plasmonics: Design, Materials, Fabrication, Characterization, and Applications XXI, PC126480G (5 October 2023); https://doi.org/10.1117/12.2672096
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KEYWORDS
Design and modelling

Materials processing

Printing

Amorphous silicon

Holography

Photonics

Visible radiation

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