Poster
20 June 2024 Combined multiexposure laser interference lithography concept for NOEMS and diffractive optics fabrication
Manuel J. L. F. F. Rodrigues, Patrícia C. Sousa, Joana D. Santos, Rosana A Dias, Filipe S. Alves, Diogo E. Aguiam
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Conference Poster
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Manuel J. L. F. F. Rodrigues, Patrícia C. Sousa, Joana D. Santos, Rosana A Dias, Filipe S. Alves, and Diogo E. Aguiam "Combined multiexposure laser interference lithography concept for NOEMS and diffractive optics fabrication", Proc. SPIE PC13005, Laser + Photonics for Advanced Manufacturing , PC1300515 (20 June 2024); https://doi.org/10.1117/12.3029564
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KEYWORDS
Lithography

Fabrication

Laser nanostructuring

Electron beam lithography

Photoresist materials

Active optics

Nanophotonics

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