Tabletop storage ring MIRRORCLE extreme ultraviolet lithography source

Hironari Yamada; Dorian Minkov; Taichi Hayashi; Daisuke Hasegawa

doi:10.1117/1.JMM.11.2.021121

29 May 2012 Tabletop storage ring MIRRORCLE extreme ultraviolet lithography source

Hironari Yamada, Dorian Minkov, Taichi Hayashi, Daisuke Hasegawa

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 11, Issue 2, 021121 (May 2012). https://doi.org/10.1117/1.JMM.11.2.021121

Abstract

Advances of tabletop electron storage rings for generating a brilliant extreme ultraviolet (EUV) or soft x-ray beam are discussed. An electron storage ring called MIRRORCLE-20SX currently provides a stored beam current with an average of 3 A, a 1-minute lifetime, 15 ms radiation damping time, and a beam size of about 3×3 mm². We generate EUV by a thin-film target placed in the electron orbit. Photons in the wavelength around 13.9 nm is generated by an Si thin film, and 4.3 nm by a diamond-like carbon (DLC) film placed in the circulating electron beam. It is known from previous experimental studies that the mechanism of EUV emission is a synchrotron Cherenkov radiation (SCR). The observed photon power is 14 W/sr by the DLC film. We report that SCR is suitable for EUV lithography (EUVL) because the spectrum is monochromatic, the radiation angular spread is as narrow as 20×5 mrad², and the emitter size can be 0.01×3 mm². An optimized EUV source for lithography based on the tabletop synchrotron is proposed.

Citation Download Citation

Hironari Yamada, Dorian Minkov, Taichi Hayashi, and Daisuke Hasegawa "Tabletop storage ring MIRRORCLE extreme ultraviolet lithography source," Journal of Micro/Nanolithography, MEMS, and MOEMS 11(2), 021121 (29 May 2012). https://doi.org/10.1117/1.JMM.11.2.021121

Published: 29 May 2012

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