11 March 2016 Optical proximity correction with hierarchical Bayes model
Author Affiliations +
Abstract
Optical proximity correction (OPC) is one of the most important techniques in today’s optical lithography-based manufacturing process. Although the most widely used model-based OPC is expected to achieve highly accurate correction, it is also known to be extremely time-consuming. This paper proposes a regression model for OPC using a hierarchical Bayes model (HBM). The goal of the regression model is to reduce the number of iterations in model-based OPC. Our approach utilizes a Bayes inference technique to learn the optimal parameters from given data. All parameters are estimated by the Markov Chain Monte Carlo method. Experimental results show that utilizing HBM can achieve a better solution than other conventional models, e.g., linear regression-based model, or nonlinear regression-based model. In addition, our regression results can be used as the starting point of conventional model-based OPC, through which we are able to overcome the runtime bottleneck.
© 2016 Society of Photo-Optical Instrumentation Engineers (SPIE) 1932-5150/2016/$25.00 © 2016 SPIE
Tetsuaki Matsunawa, Bei Yu, and David Z. Pan "Optical proximity correction with hierarchical Bayes model," Journal of Micro/Nanolithography, MEMS, and MOEMS 15(2), 021009 (11 March 2016). https://doi.org/10.1117/1.JMM.15.2.021009
Published: 11 March 2016
Lens.org Logo
CITATIONS
Cited by 30 scholarly publications and 2 patents.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Optical proximity correction

Data modeling

Model-based design

Performance modeling

Statistical modeling

Simulation of CCA and DLA aggregates

Feature extraction

RELATED CONTENT

Model based pattern matching
Proceedings of SPIE (December 04 2008)
The effect of OPC optical and resist model parameters on...
Proceedings of SPIE (October 20 2006)
Merits of cellwise model-based OPC
Proceedings of SPIE (May 03 2004)
Hybrid optical proximity correction: concepts and results
Proceedings of SPIE (December 27 2002)

Back to Top