Special Section Guest Editorial: Direct Write Lithography

Stephen P. Renwick; Laurent Pain

doi:10.1117/1.JMM.22.4.041401

2 December 2023 Special Section Guest Editorial: Direct Write Lithography

Stephen P. Renwick, Laurent Pain

Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 22, Issue 4, 041401 (December 2023). https://doi.org/10.1117/1.JMM.22.4.041401

Abstract

Guest editors Stephen Renwick and Laurent Pain introduce the Special Section on Direct Write Lithography.

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Stephen P. Renwick and Laurent Pain "Special Section Guest Editorial: Direct Write Lithography," Journal of Micro/Nanopatterning, Materials, and Metrology 22(4), 041401 (2 December 2023). https://doi.org/10.1117/1.JMM.22.4.041401

Published: 2 December 2023

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KEYWORDS

Direct write lithography

Electron beam direct write lithography

Lithography

Semiconducting wafers

Photomasks

Semiconductors

Vestigial sideband modulation

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