Nebulous hotspot and algorithm variability in computation lithography

Edmund Y. Lam; Alfred K. K. Wong

doi:10.1117/1.3459937

1 July 2010 Nebulous hotspot and algorithm variability in computation lithography

Edmund Y. Lam, Alfred K. K. Wong

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 9, Issue 3, 033002 (July 2010). https://doi.org/10.1117/1.3459937

Abstract

Computation lithography relies on algorithms. However, these algorithms exhibit variability that can be as much as 5% (one standard deviation) of the critical dimension for the 65-nm technology. Using hotspot analysis and fixing as an example, we argue that such variability can be addressed on the algorithm level via controlling and eliminating its root causes, and on the application level by setting specifications that are commensurate with both the limitations of the algorithms and the goals of the application.

©(2010) Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation Download Citation

Edmund Y. Lam and Alfred K. K. Wong "Nebulous hotspot and algorithm variability in computation lithography," Journal of Micro/Nanolithography, MEMS, and MOEMS 9(3), 033002 (1 July 2010). https://doi.org/10.1117/1.3459937

Published: 1 July 2010

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