Spatial-frequency bandwidth in the photolithographic transfer of submicron gratings

Olivier M. Parriaux; Henry Vuilliomenet; Pierre Sixt; Nathalie Cuny

doi:10.1117/12.200610

1 September 1995 Spatial-frequency bandwidth in the photolithographic transfer of submicron gratings

Olivier M. Parriaux, Henry Vuilliomenet, Pierre Sixt, Nathalie Cuny

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Optical Engineering, Vol. 34, Issue 9, (September 1995). https://doi.org/10.1117/12.200610

Abstract

The principle of the photolithographic mask transfer of high-spatial-frequency gratings under the Littrow angle is shown to be so tolerant that a broad spatial-frequency spectrum can be transferred under the same exposure conditions.

Citation Download Citation

Olivier M. Parriaux, Henry Vuilliomenet, Pierre Sixt, and Nathalie Cuny "Spatial-frequency bandwidth in the photolithographic transfer of submicron gratings," Optical Engineering 34(9), (1 September 1995). https://doi.org/10.1117/12.200610

Published: 1 September 1995

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