Through-focus technique for grating linewidth analysis with nanometer sensitivity

Yi-Sha Ku; An-Shun Liu; Nigel Peter Smith

doi:10.1117/1.2404959

1 December 2006 Through-focus technique for grating linewidth analysis with nanometer sensitivity

Yi-Sha Ku, An-Shun Liu, Nigel Peter Smith

Author Affiliations +

Optical Engineering, Vol. 45, Issue 12, 123602 (December 2006). https://doi.org/10.1117/1.2404959

Abstract

We present a new algorithm for determining nano-scale feature dimensions of grating structures with a bright-field imaging tool. The algorithm is based on the intensity and focus quality of images obtained with varying amounts of defocus. Analysis of the intensity of optical images obtained at various focal positions demonstrates nanometer sensitivity with grating structures. An empirical quadratic model was developed to fit the experimental results of image intensity versus critical dimension.

©(2006) Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation Download Citation

Yi-Sha Ku, An-Shun Liu, and Nigel Peter Smith "Through-focus technique for grating linewidth analysis with nanometer sensitivity," Optical Engineering 45(12), 123602 (1 December 2006). https://doi.org/10.1117/1.2404959

Published: 1 December 2006

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available