Open Access
1 July 2011 Densification of silicon carbide using oxy-nitride additives for space-based telescope mirror applications
R. Suresh Kumar, Anoop K. Shukla, Sankaranarayanan Babu, Dhenuvakonda Sivakumar, Ashutosh S. Gandhi
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Abstract
Densification behavior of alpha silicon carbide (SiC) during vacuum hot pressing was studied up to 1900ºC with sintering additives based on AlN and Y2O3 in different proportions. Near theoretical density was obtained with a total sintering additive content of < 4 vol.%. The microstructure of SiC sintered with AlN+Y2O3 revealed fine equiaxed grains against the additional elongated grains exhibited by SiC sintered with AlN alone. The SiC having high density exhibited very good strength, elastic modulus, high thermal conductivity, low coefficient of thermal expansion and excellent polishability for telescope mirror applications.
©(2011) Society of Photo-Optical Instrumentation Engineers (SPIE)
R. Suresh Kumar, Anoop K. Shukla, Sankaranarayanan Babu, Dhenuvakonda Sivakumar, and Ashutosh S. Gandhi "Densification of silicon carbide using oxy-nitride additives for space-based telescope mirror applications," Optical Engineering 50(7), 070504 (1 July 2011). https://doi.org/10.1117/1.3610987
Published: 1 July 2011
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CITATIONS
Cited by 4 scholarly publications.
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KEYWORDS
Silicon carbide

Aluminum nitride

Mirrors

Space telescopes

Polishing

Surface finishing

Chemical vapor deposition

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