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1 July 2013 Field curvature correction in multichannel miniature imaging systems suited for wafer-level production
Eric Logean, Toralf Scharf, Nicolas Bongard, Hans Peter Herzig, Markus Rossi
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Optical Engineering, Vol. 52, Issue 7, 075101 (July 2013). https://doi.org/10.1117/1.OE.52.7.075101
Abstract
Using multiple optical channels increases the number of design possibilities for the objectives of mobile imaging devices. For easy wafer-level fabrication, we start from a single optical element—a monocentric plano-convex lens. The quality of the areal image is used to select the size of the field of each channel. Each channel optics is axially positioned to reduce the effect of the image field curvature. The resulting device has a small number of channels and it images a full field of view of ±40 deg with an f -number of 3. Details of the optical design, of the fabrication process, and of the device performance are reported.
CC BY: © The Authors. Published by SPIE under a Creative Commons Attribution 4.0 Unported License. Distribution or reproduction of this work in whole or in part requires full attribution of the original publication, including its DOI.
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Eric Logean, Toralf Scharf, Nicolas Bongard, Hans Peter Herzig, and Markus Rossi "Field curvature correction in multichannel miniature imaging systems suited for wafer-level production," Optical Engineering 52(7), 075101 (1 July 2013). https://doi.org/10.1117/1.OE.52.7.075101
Published: 1 July 2013
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Cited by 1 scholarly publication and 1 patent.
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KEYWORDS
Monochromatic aberrations
Objectives
Image sensors
Image quality
Modulation transfer functions
Semiconducting wafers
Sensors
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