Metrology test artifact availability improvement

Benjamin D. Bunday

doi:10.1117/12.2615726

26 May 2022 Metrology test artifact availability improvement

Benjamin D. Bunday

Proceedings Volume 12053, Metrology, Inspection, and Process Control XXXVI; 120531C (2022) https://doi.org/10.1117/12.2615726
Event: SPIE Advanced Lithography + Patterning, 2022, San Jose, California, United States

Conference Poster

Abstract

Difficulties in availability of important metrology test artifacts is being addressed with a new advanced metrology patterning reticle, AMAG7, which makes available again and updates the suite of key metrology diagnostic and experimental content to the industry previously provided by SEMATECH AMAG. New content covers a broad range of scale regimes from the absolute resolution limits of iArF lithography up to 1um for comparing to larger scales, and including new use cases which have evolved since previous AMAG reticles such as features for contour metrology, EPE, two-level gratings and more. The main grating content of lines, trenches, holes, dots and many variations thereof, is in form of 547 huge 0.8mm gratings measurable by any type of CD measurement tool in discussion in the metrology sector including CD-SAXS with large spot sizes but also by any other tool type with smaller sampling areas, resulting in new IP-neutral test vehicles to enable full open collaboration across the industry. This poster will introduce the newly-designed AMAG7 pattern and demonstrate the achievable lithography and possible test artifacts that can be enabled.

Citation Download Citation

Benjamin D. Bunday "Metrology test artifact availability improvement", Proc. SPIE 12053, Metrology, Inspection, and Process Control XXXVI, 120531C (26 May 2022); https://doi.org/10.1117/12.2615726

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