Imaging quality evaluation of superlens based nanolithography

Lihong Liu; Huwen Ding; Lisong Dong; Libin Zhang; Yayi Wei

doi:10.1117/12.2628122

25 May 2022 Imaging quality evaluation of superlens based nanolithography

Lihong Liu, Huwen Ding, Lisong Dong, Libin Zhang, Yayi Wei

Proceedings Volume 12054, Novel Patterning Technologies 2022; 120540C (2022) https://doi.org/10.1117/12.2628122
Event: SPIE Advanced Lithography + Patterning, 2022, San Jose, California, United States

Conference Poster

Abstract

Imaging capability of surface plasma based nano-patterning is discussed in this article. The imaging capabilityof 1:1imaging ratio is the basis, which is different with the interference lithography with the frequency multiplicationontheimage plan. In this article, “Superlens” is discussed. The imaging capability evaluation is based on the rigorouselectromagnetic modelling of Finite Element Method. Theoretical analysis and numerical evaluation are given, detailedimpact evaluation of a variety of important parameters to the imaging capability is presented.

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Lihong Liu, Huwen Ding, Lisong Dong, Libin Zhang, and Yayi Wei "Imaging quality evaluation of superlens based nanolithography", Proc. SPIE 12054, Novel Patterning Technologies 2022, 120540C (25 May 2022); https://doi.org/10.1117/12.2628122

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