Dr. Libin Zhang Profile

Dr. Libin Zhang

at Institute of Microelectronics CAS

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Author

Publications (17)

Proceedings Article | 10 April 2024 Poster + Paper

Using machine learning method to improve design sampling efficiency for fab applications

Zhengguo Tian, Yayi Wei, Yajuan Su, Libin Zhang, Lisong Dong, Le Ma

Proceedings Volume 12954, 129541H (2024) https://doi.org/10.1117/12.3009964

KEYWORDS: Machine learning, Data modeling, Optical proximity correction, Design, Semiconducting wafers, Environmental monitoring, Engineering, Scanning electron microscopy, Sampling rates, Feature extraction

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Proceedings Article | 25 May 2022 Poster + Paper

Imaging quality evaluation of superlens based nanolithography

Lihong Liu, Huwen Ding, Lisong Dong, Libin Zhang, Yayi Wei

Proceedings Volume 12054, 120540C (2022) https://doi.org/10.1117/12.2628122

KEYWORDS: Dielectrics, Silver, Photoresist materials, 3D modeling, Polymethylmethacrylate, Nanolithography, Photomasks, Chromium, Metals

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SPIE Journal Paper | 21 December 2021

Aberration analysis and compensate method of fully connected neural network in deep ultraviolet lithography

Shuang Zhang, Libin Zhang, Tianyang Gai, Pengzheng Gao, Yayi Wei

OE, Vol. 60, Issue 12, 123105, (December 2021) https://doi.org/10.1117/12.10.1117/1.OE.60.12.123105

KEYWORDS: Lithography, Neural networks, Deep ultraviolet, Data modeling, Source mask optimization, Photomasks, Optical engineering, Zernike polynomials, Machine learning, Image enhancement

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SPIE Journal Paper | 15 July 2021

Data augmentation in hotspot detection based on generative adversarial network

Shuhan Wang, Tianyang Gai, Tong Qu, Bojie Ma, Xiaojing Su, Lisong Dong, Libin Zhang, Peng Xu, Yajuan Su, Yayi Wei

JM3, Vol. 20, Issue 03, 034201, (July 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.3.034201

KEYWORDS: Gallium nitride, Data modeling, Performance modeling, Binary data, Machine learning, Statistical modeling, Lithography, Convolution, Computer programming, Microelectronics

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SPIE Journal Paper | 23 March 2021

Projection-based high coverage fast layout decomposing algorithm of metal layer for accelerating lithography friendly design at full chip level

Xiaojing Su, Dong Shen, Yayi Wei, Yajuan Su, Lisong Dong, Rui Chen, Tianyang Gai, Libin Zhang

JM3, Vol. 20, Issue 01, 013401, (March 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.1.013401

KEYWORDS: Metals, Lithography, Optical proximity correction, Standards development, Computer simulations, Logic, Transistors, System integration, Semiconductors, Semiconducting wafers

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Proceedings Article | 22 February 2021 Poster + Paper

SRAF generation based on SGM/CTM contour line

Pengzheng Gao, Libin Zhang, Ya Yi Wei

Proceedings Volume 11613, 116130R (2021) https://doi.org/10.1117/12.2583694

KEYWORDS: SRAF, Resolution enhancement technologies, Source mask optimization, Optical proximity correction, Model-based design, Image processing, Image quality

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Proceedings Article | 22 February 2021 Poster + Presentation + Paper

Method to improve the overlay image contrast and optimize the sub-segmentation mark

Libin Zhang, Cong Lu, Yaobin Feng, Yayi Wei

Proceedings Volume 11611, 1161131 (2021) https://doi.org/10.1117/12.2583820

KEYWORDS: Overlay metrology, Metrology, Signal processing, Image processing, Image contrast enhancement, Transparency, Optical testing, Optical signal processing, Image enhancement, Image acquisition

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Proceedings Article | 22 February 2021 Presentation + Paper

Multi-level layout hotspot detection based on multi-classification with deep learning

Tianyang Gai, Tong Qu, Xiaojing Su, Shuhan Wang, Lisong Dong, Libin Zhang, Rui Chen, Yajuan Su, Yayi Wei, Tianchun Ye

Proceedings Volume 11614, 116140W (2021) https://doi.org/10.1117/12.2583726

KEYWORDS: Data modeling, Neural networks, Sensors, Performance modeling, Optics manufacturing, Machine learning, Lithography, Convolutional neural networks, Yield improvement, Statistical modeling

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Proceedings Article | 22 February 2021 Poster + Paper

A study on diffraction-based overlay measurement based on FDTD method

Buqing Xu, Qiang Wu, Rui Chen, Lisong Dong, Libin Zhang, Yayi Wei

Proceedings Volume 11611, 116113B (2021) https://doi.org/10.1117/12.2581909

KEYWORDS: Overlay metrology, Chemical mechanical planarization, Finite-difference time-domain method, Diffraction, Signal processing, Semiconductor manufacturing, Metrology, Visible radiation, Tolerancing, Reliability

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Proceedings Article | 20 September 2020 Presentation + Paper

Design rule optimization for via layers of multiple patterning solution at 7nm technology node

Xiaojing Su, Yayi Wei, Lisong Dong, Libin Zhang, Yajuan Su, Rui Chen

Proceedings Volume 11518, 115180O (2020) https://doi.org/10.1117/12.2573157

KEYWORDS: Optical lithography, Immersion lithography, Lithography, Photomasks, Source mask optimization, Manufacturing, Overlay metrology, Data processing, Standards development, Back end of line

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Proceedings Article | 23 March 2020 Paper

Via optimization methodology for enhancing robustness of design at 14/12nm technology node

Xiaojing Su, Libin Zhang, Yayi Wei, Rui Chen, Yajuan Su, Lisong Dong, Chunshan Du, Qijian Wan, Xinyi Hu

Proceedings Volume 11328, 1132810 (2020) https://doi.org/10.1117/12.2551902

KEYWORDS: Metals, Optical proximity correction, Photovoltaics, Lithography, Double patterning technology, Optical lithography, Yield improvement, Microelectronics, Back end of line, Critical dimension metrology

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SPIE Journal Paper | 30 May 2019

Probability prediction model for bridging defects induced by combined influences from lithography and etch variations

Xiaojing Su, Dong Shen, Yayi Wei, Taian Fan, Lisong Dong, Libin Zhang, Yajuan Su, Rui Chen, Tianchun Ye

JM3, Vol. 18, Issue 02, 023503, (May 2019) https://doi.org/10.1117/12.10.1117/1.JMM.18.2.023503

KEYWORDS: Line edge roughness, Failure analysis, Bridges, Etching, Lithography, Probability theory, Overlay metrology, Photomasks, Metals, Optical proximity correction

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Proceedings Article | 25 March 2019 Paper

Phase behavior of polymer blend materials for polystyrene-b-polycarbonate (PS-b-PC) block copolymers and corresponding homopolymer polystyrene

Weichen Liu, Baolin Zhang, Libin Zhang, Xiaobin He, Yayi Wei, Xin Wu, Junyan Dai, Ruicheng Ran, Guoping Mao

Proceedings Volume 10960, 109601J (2019) https://doi.org/10.1117/12.2514461

KEYWORDS: Polymers, Annealing, Directed self assembly, Coating, Microelectronics, Roads, Statistical analysis, Integrated circuits

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Proceedings Article | 20 March 2018 Paper

The method of optimizing mask parameter suitable for lithography process

Jianfang He, Lisong Dong, Libin Zhang, Lijun Zhao, Yayi Wei, Tianchun Ye

Proceedings Volume 10587, 1058719 (2018) https://doi.org/10.1117/12.2296861

KEYWORDS: Photomasks, Lithography, Source mask optimization, Calibration, Visualization, Metals, Geometrical optics, 3D acquisition, Manufacturing

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SPIE Journal Paper | 24 August 2017

Optimization of the focus monitor mark in immersion lithography according to illumination type

Lisong Dong, Libin Zhang, Xiaojing Su, Jianfang He, Yayi Wei

JM3, Vol. 16, Issue 03, 033505, (August 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.3.033505

KEYWORDS: Photomasks, Lithographic illumination, Immersion lithography, Phase shifts, Etching, Picosecond phenomena, Diffraction, Lithography, Scanners, Manufacturing

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Proceedings Article | 28 March 2017 Paper

New alignment mark design structures for higher diffraction order wafer quality enhancement

Libin Zhang, Yaobin Feng, Lisong Dong, Xiaojing Su, Zhengguo Tian, Chao Fang, Yayi Wei, Tianchun Ye

Proceedings Volume 10145, 101452C (2017) https://doi.org/10.1117/12.2257627

KEYWORDS: Optical alignment, Diffraction, Semiconducting wafers, Structural design, Overlay metrology, Optical design, Diffraction gratings, Interfaces, Process control, Manufacturing, Scanners, Oxides, Lithography, Absorption

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SPIE Journal Paper | 20 December 2016

Optimization of resist parameters to improve the profile and process window of the contact pattern in advanced node

Lisong Dong, Libin Zhang, Xiaojing Su, Zhiyang Song, Yayi Wei, Tianchun Ye

JM3, Vol. 15, Issue 04, 043509, (December 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.4.043509

KEYWORDS: Photoresist processing, Photomasks, Critical dimension metrology, Lithography, Semiconducting wafers, Electroluminescence, Process modeling, Optimization (mathematics), Refractive index, Binary data

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Showing 5 of 17 publications

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