Model validation for scanning electron microscopy

O. Yu Ridzel; W. Yamane; I. Mansaray; J. S. Villarrubia

doi:10.1117/12.2661103

27 April 2023 Model validation for scanning electron microscopy

O. Yu Ridzel, W. Yamane, I. Mansaray, J. S. Villarrubia

Proceedings Volume 12496, Metrology, Inspection, and Process Control XXXVII; 124960T (2023) https://doi.org/10.1117/12.2661103
Event: SPIE Advanced Lithography + Patterning, 2023, San Jose, California, United States

Abstract

We are beginning projects to validate the physics models used for interpretation of electron microscopy images. In one of them, we will measure electron yields and energy spectra from cleaned well-characterized samples subjected to electron bombardment inside of a spherical retarding field analyzer in ultra-high vacuum. In another, we will measure the same features, lithographically patterned on free-standing Si membranes, with measurement techniques that differ in their interaction physics. A modeling project will compare measurement results with simulations using existing and new models. Good models should predict the observed yields and produce agreement among measurement techniques.

Conference Presentation

Citation Download Citation

O. Yu Ridzel, W. Yamane, I. Mansaray, and J. S. Villarrubia "Model validation for scanning electron microscopy", Proc. SPIE 12496, Metrology, Inspection, and Process Control XXXVII, 124960T (27 April 2023); https://doi.org/10.1117/12.2661103

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