Beyond EUV lithography: could direct micro-(nano-)structuring by intense EUV/x-ray radiation be engaged with microchip production? (Conference Presentation)

Libor Juha

doi:10.1117/12.2665993

6 June 2023 Beyond EUV lithography: could direct micro-(nano-)structuring by intense EUV/x-ray radiation be engaged with microchip production? (Conference Presentation)

Libor Juha

Author Affiliations +

Proceedings Volume 12578, Optics Damage and Materials Processing by EUV/X-ray Radiation (XDam8); 125780D (2023) https://doi.org/10.1117/12.2665993
Event: SPIE Optics + Optoelectronics, 2023, Prague, Czech Republic

Abstract

Nowadays, the mass production of micro- and nano-structures for highly integrated electronic circuits is dominated by extreme ultraviolet lithography (EUVL). This is multiple step processing the key step of which is represented by a transfer and demagnification of structural motif from either reflective or transmission masks with electromagnetic radiation having a typical wavelength of 13.5 nm delivered most frequently from optimized laser-produced plasma sources. Thus a latent micro/nano-structure is created in a suitable resist which should be etched. Then, a series of further processing steps should be applied to create a wanted 3D structure in an electronic device. Nevertheless, the number of processing steps can be reduced if an EUV/x-ray laser-induced materials erosion (desorption/ablation) would be engaged in manufacturing the micro/nano-structures. In this contribution, it will be discussed whether structures with sufficiently small details can be produced by intense extreme ultraviolet and x-ray radiation directly at an acceptable level of quality, with a high yield. Pulse duration and wavelength effects will be elucidated in both ablation and desorption modes of materials erosion. Special attention will be paid to processes, both thermal and nonthermal, which could blur the structural motif. Their investigation should help to eliminate them creating well developed structures having sharp edges.

Conference Presentation

Citation Download Citation

Libor Juha "Beyond EUV lithography: could direct micro-(nano-)structuring by intense EUV/x-ray radiation be engaged with microchip production? (Conference Presentation)", Proc. SPIE 12578, Optics Damage and Materials Processing by EUV/X-ray Radiation (XDam8), 125780D (6 June 2023); https://doi.org/10.1117/12.2665993

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
PRESENTATION

WATCH
PRESENTATION SAVE TO MY LIBRARY

GET CITATION

KEYWORDS

Extreme ultraviolet lithography

Laser processing

Electronic circuits

Electronic components

Extreme ultraviolet

Manufacturing

Photomasks

Show All Keywords

Keywords/Phrases

Search In:

Publication Years