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13 November 2024 Metrology-class EUV light source based on broadband emission from copper-target laser produced plasma
Seth L. Cousin, Feng Dong, Stuart Sherwin, Matt Hettermann, Dave Houser, Patrick Naulleau
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Proceedings Volume 13216, Photomask Technology 2024; 132160X (2024) https://doi.org/10.1117/12.3035515
Event: SPIE Photomask Technology + EUV Lithography, 2024, Monterey, California, United States
Abstract
The performance and characteristics of our broadband EUV source derived from copper-based laser produced plasma, currently in use in our EUV reflectometer and EUV Scatterometry tool are presented in this submission.
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Seth L. Cousin, Feng Dong, Stuart Sherwin, Matt Hettermann, Dave Houser, and Patrick Naulleau "Metrology-class EUV light source based on broadband emission from copper-target laser produced plasma", Proc. SPIE 13216, Photomask Technology 2024, 132160X (13 November 2024); https://doi.org/10.1117/12.3035515
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KEYWORDS
Extreme ultraviolet
Metrology
Plasma
Light sources
Copper
Pulsed laser operation
Engineering
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