Paper
7 December 1994 Quality assurance of focused ion beam (FIB) repaired areas
Koji Hiruta, Hideyuki Kanemitsu, Akira Morishige
Author Affiliations +
Abstract
Laser repair is generally used to repair opaque defects on reticle because it can remove them without any damage. However, it doesn't have enough repair accuracy to repair next- generation reticles. So, we examined the shapes and optical intensity of the repaired areas to understand the damage that focused ion beam (FIB) would cause to these areas comparing laser repair and to apply it to practical reticle production line. From this study, it was shown that FIB forms deep V-grooves which cause changes in optical intensity on the repaired quartz area as a result of spattering and laser repair forms a smooth dent on the contrary. Therefore, a new opaque defect repair technique by FIB with gas assisted chemical etching system must be developed. In this paper, we address the results of metrology study of the repaired area by FIB and laser repair.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Koji Hiruta, Hideyuki Kanemitsu, and Akira Morishige "Quality assurance of focused ion beam (FIB) repaired areas", Proc. SPIE 2322, 14th Annual BACUS Symposium on Photomask Technology and Management, (7 December 1994); https://doi.org/10.1117/12.195827
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KEYWORDS
Quartz

Reticles

Etching

Opacity

Photomask technology

Ions

Inspection

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