Multimode electron beam imaging and metrology

Kevin M. Monahan

doi:10.1117/12.209217

22 May 1995 Multimode electron beam imaging and metrology

Kevin M. Monahan

Proceedings Volume 2439, Integrated Circuit Metrology, Inspection, and Process Control IX; (1995) https://doi.org/10.1117/12.209217
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

In this work, we address the 0.25 micrometers yield management applications of multimode electron beam imaging using both backscattered and secondary electrons. The prospects for achieving aggressive performance specifications for quarter-micrometer process control in imaging, metrology and productivity are analyzed, and supporting examples are provided.

Citation Download Citation

Kevin M. Monahan "Multimode electron beam imaging and metrology", Proc. SPIE 2439, Integrated Circuit Metrology, Inspection, and Process Control IX, (22 May 1995); https://doi.org/10.1117/12.209217

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available