Paper
7 July 1997 Diffusivity measurements in polymers: I. Lithographic modeling results
Chris A. Mack, Katherine E. Mueller, Allen B. Gardiner, Anwei Qin, Ralph R. Dammel, William J. Koros, C. Grant Willson
Author Affiliations +
Abstract
A first-principles study into the effects of residual casting solvent on the lithographic properties of photoresist has been initiated. Solvent content has been measured using a quartz crystal microbalance and using radio-labeled solvent with scintillation counting. Resists of measured solvent content were then tested for their dissolution properties. Early results have been presented which show the expected strong relationship between solvent content and dissolution rate. Incorporation of these results into lithographic simulation allows the prediction of resist linewidth as a function of post apply bake conditions.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Chris A. Mack, Katherine E. Mueller, Allen B. Gardiner, Anwei Qin, Ralph R. Dammel, William J. Koros, and C. Grant Willson "Diffusivity measurements in polymers: I. Lithographic modeling results", Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, (7 July 1997); https://doi.org/10.1117/12.275906
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Cited by 10 scholarly publications.
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KEYWORDS
Lithography

Polymers

Crystals

Photoresist materials

Quartz

Scintillation

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