Paper
17 September 1997 Modified electronic speckle pattern shearing interferometry for simultaneous derivative map measurements
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Proceedings Volume 3098, Optical Inspection and Micromeasurements II; (1997) https://doi.org/10.1117/12.281162
Event: Lasers and Optics in Manufacturing III, 1997, Munich, Germany
Abstract
Electronic speckle pattern shearing interferometry (ESPSI) allows for the measurement of displacement derivative maps. To monitor the stress/strain state of an object surface and its material properties, it is necessary to measure more than one displacement derivative map. The conventional configuration of ESPSI has been modified by parallel adaptation of Michelson shearing interferometers and an optoelectronic/image processing head with the capability of simultaneous capturing of 2 images. The automatic analysis of speckle fields is performed by temporal phase stepping method with the separation of the information by orthogonal polarization states. In the paper the opto-mechanical and electronic configuration of the system is presented. The experimental results obtained in the modified ESPIS system, when applied to determination of shear strain in a tensile loaded aluminium specimen are also presented.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Grzegorz Dymny, Malgorzata Kujawinska, and Stephan Waldner "Modified electronic speckle pattern shearing interferometry for simultaneous derivative map measurements", Proc. SPIE 3098, Optical Inspection and Micromeasurements II, (17 September 1997); https://doi.org/10.1117/12.281162
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KEYWORDS
Image processing

Interferometry

Speckle pattern

Polarization

Optoelectronics

Finite element methods

Mirrors

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