LAVA: lithography analysis using virtual access

Chang Hsu; Rona Yang; Jeffery Cheng; Peter Chien; Victor Wen; Andrew R. Neureuther

doi:10.1117/12.310748

29 June 1998 LAVA: lithography analysis using virtual access

Chang Hsu, Rona Yang, Jeffery Cheng, Peter Chien, Victor Wen, Andrew R. Neureuther

Proceedings Volume 3334, Optical Microlithography XI; (1998) https://doi.org/10.1117/12.310748
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

A web site allowing remote operation of the SPLAT, SAMPLE, TEMPEST and SIMPL simulators has been developed to promote collaborative work on lithography and in particular on EUV technology. Based on the extensive use of platform independent programming languages, LAVA is accessible from all modern computing platforms. The software supporting the web site is available to others in creating similar web site sites and in making simulators such as those from other universities 'play' together. The web site explores new paradigms in remote operation of lithography simulators and introduces more application-oriented modes of interaction with technologists. The LAVA web site URL is http://cuervo.eecs.berkeley.edu/Volcano/

Citation Download Citation

Chang Hsu, Rona Yang, Jeffery Cheng, Peter Chien, Victor Wen, and Andrew R. Neureuther "LAVA: lithography analysis using virtual access", Proc. SPIE 3334, Optical Microlithography XI, (29 June 1998); https://doi.org/10.1117/12.310748

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