Multivariate run-to-run control of arm-to-arm variations in chemical mechanical planarization

W. Jarrett Campbell; Chris Raeder; Valerie Wenner; Thomas F. Edgar

doi:10.1117/12.324360

3 September 1998 Multivariate run-to-run control of arm-to-arm variations in chemical mechanical planarization

W. Jarrett Campbell, Chris Raeder, Valerie Wenner, Thomas F. Edgar

Proceedings Volume 3507, Process, Equipment, and Materials Control in Integrated Circuit Manufacturing IV; (1998) https://doi.org/10.1117/12.324360
Event: Microelectronic Manufacturing, 1998, Santa Clara, CA, United States

Abstract

With the introduction of high-throughput, multi-arm chemical-mechanical planarization (CMP) tools, a new source of process variation is introduced to the CMP process. These arm-to-arm variations are caused by small differences in the polishing rates of each arm. Modeling the arm-to-arm interactions of a CMP tool allows the application of a model-based, multi-variable, run-to-run control scheme. This control scheme is an optimization-based approach using pilot wafers applied to 'out of control' processes.In addition, this paper outlines a controller that can be applied directly to production wafers. The production-based run-to- run controller allows for monitoring the process through statistical process control methods and utilizes known relationships between product and pilot wafer removal rates in order to keep the process 'in control'. The product-based controller will be automated and deployed in AMD's Fab25- micron facility in Austin, TX using the software developed under the Advanced Control Framework Initiative.

Citation Download Citation

W. Jarrett Campbell, Chris Raeder, Valerie Wenner, and Thomas F. Edgar "Multivariate run-to-run control of arm-to-arm variations in chemical mechanical planarization", Proc. SPIE 3507, Process, Equipment, and Materials Control in Integrated Circuit Manufacturing IV, (3 September 1998); https://doi.org/10.1117/12.324360

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available