KrF-excimer-laser-induced ohmic metallization of ZnO substrate

Toshimitsu Akane; Koji Sugioka; Katsumi Midorikawa

doi:10.1117/12.387558

7 June 2000 KrF-excimer-laser-induced ohmic metallization of ZnO substrate

Toshimitsu Akane, Koji Sugioka, Katsumi Midorikawa

Proceedings Volume 3933, Laser Applications in Microelectronic and Optoelectronic Manufacturing V; (2000) https://doi.org/10.1117/12.387558
Event: Symposium on High-Power Lasers and Applications, 2000, San Jose, CA, United States

Abstract

A non-alloy ohmic contact is fabricate on hydrothermally grown n-type ZnO substrate by KrF excimer laser pre- irradiation and metal deposition. The laser irradiation breaks Zn-O bonding, and turns ZnO surface layer to Zn-rich one which has lower sheet resistance than that of bulk, and has n-type conduction. The Zn-rich pre-metallized layer enables current conducting into ZnO substrate with ohmic characteristics. Au/In/ZnO_x and In/ZnO_x contact fabricated by single pulse laser irradiation has specific contact resistivity of approximately 7 X 10^-1 (Omega) cm². Deterioration of contact resistance is confirmed after 5 minutes annealing at 300 degrees C in N₂, which is originated by re-bonding of Zn-O in laser irradiated area.

Citation Download Citation

Toshimitsu Akane, Koji Sugioka, and Katsumi Midorikawa "KrF-excimer-laser-induced ohmic metallization of ZnO substrate", Proc. SPIE 3933, Laser Applications in Microelectronic and Optoelectronic Manufacturing V, (7 June 2000); https://doi.org/10.1117/12.387558

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