Maskless 3D micromachining with focused ion beam of high-resolution diffractive optics

Chantal G. Khan Malek; Frank T. Hartley; Jayant Neogi

doi:10.1117/12.390040

21 July 2000 Maskless 3D micromachining with focused ion beam of high-resolution diffractive optics

Chantal G. Khan Malek, Frank T. Hartley, Jayant Neogi

Proceedings Volume 3997, Emerging Lithographic Technologies IV; (2000) https://doi.org/10.1117/12.390040
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

We discuss here the capability and details of direct manufacture of various high-resolution diffractive optics using focused ion beam (FIB) micromachining. In preliminary demonstrations illustrating the capability of the technique, zone plates and gratings were milled in gold using a reactive atmosphere in an automated FIB system operating at 30 keV with a Gallium liquid metal ion source equipped with an iodine beam gas injection system (GIS). Gratings with 20 nm line width and zone plates with 32 nm outer ring were milled directly through 3.5 micrometer and 800 nm of gold respectively.

Citation Download Citation

Chantal G. Khan Malek, Frank T. Hartley, and Jayant Neogi "Maskless 3D micromachining with focused ion beam of high-resolution diffractive optics", Proc. SPIE 3997, Emerging Lithographic Technologies IV, (21 July 2000); https://doi.org/10.1117/12.390040

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