Paper
23 June 2000 Mechanism-dependent resolution for protein micro/nano-patterning
Author Affiliations +
Abstract
The resolution of the protein patterning on polymer surfaces is modulated by the mechanism of attachment. Two mechanisms can be applied for the high resolution patterning on radiation-assisted functionalized polymer surfaces: hydrophobicity-controlled; and chemical linkage patterning. The present contribution assesses the merits and drawbacks of these two mechanisms in terms of resolution and contrast of protein/peptide features. Two microlithographic materials (an acrylate-based system and a diazo-naphto-quinone one); and two lithographic methods (e-beam and optical) have been used to test the merits of the protein patterning mechanisms. Finally these two 'model' materials have been used in a bi-layer architecture. The hydrophobicity-controlled patterning produces sharp images but with multiple defects, whereas chemical linkage produces defect-free images but with a decreased contrast.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Dan V. Nicolau "Mechanism-dependent resolution for protein micro/nano-patterning", Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, (23 June 2000); https://doi.org/10.1117/12.388330
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KEYWORDS
Proteins

Electron beam lithography

Optical lithography

Photoresist materials

Polymers

Luminescence

Chemistry

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