Paper
21 January 2003 Tunable Fabry-Perot-Interferometer for 3-5 μm wavelength with bulk micromachined reflector carrier
Steffen Kurth, Karla Hiller, Norbert Neumann, Matthias Heinze, Wolfram Doetzel, Thomas Gessner
Author Affiliations +
Proceedings Volume 4983, MOEMS and Miniaturized Systems III; (2003) https://doi.org/10.1117/12.472762
Event: Micromachining and Microfabrication, 2003, San Jose, CA, United States
Abstract
This contribution deals with design, fabrication and test of a micromachined first order Fabry-Perot-Interferometer (FPI) usable as tunable infrared filter in a spectrometer. The approach discussed here minimizes mirror curvature by using relative thick (300 μm Si ) mirror carriers for the fixed and the movable mirror of the FPI. We use thermally grown λ/4 thick SiO2 for antireflection layer at the mirror back side and for the first low refractive layer followed by a λ/4 thick polycrystalline silicon high refractive layer. Second and third λ/4 layer pairs of SiO2 and polycrystalline silicon complete the mirrors. The cavity size is electrostically tuned and capacitively detected by a closed loop control.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Steffen Kurth, Karla Hiller, Norbert Neumann, Matthias Heinze, Wolfram Doetzel, and Thomas Gessner "Tunable Fabry-Perot-Interferometer for 3-5 μm wavelength with bulk micromachined reflector carrier", Proc. SPIE 4983, MOEMS and Miniaturized Systems III, (21 January 2003); https://doi.org/10.1117/12.472762
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Cited by 10 scholarly publications and 1 patent.
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KEYWORDS
Mirrors

Silicon

Electrodes

Oxides

Reflectivity

Wet etching

Refractive index

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