Paper
16 June 2003 Compact laser plasma EUV source based on a gas puff target for metrology
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Abstract
In the paper a newly developed compact laser plasma EUV source is presented. The source is based on the double-stream gas puff target approach. The targets are formed by pulsed injection of high-Z gas (xenon) into a hollow stream of low-Z gas (helium) using the valve system composed of two electromagnetic valves and equipped with the double-nozzle setup. The outer stream of gas confines the inner stream improving the gas puff target characteristics (higher density of high-Z gas at longer distance from the nozzle output). It causes efficient absorption of laser energy in a plasma and strong EUV production. The source has been developed in the frame of the EUV sources development project under the MEDEA+ program.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Henryk Fiedorowicz, Andrzej Bartnik, Roman Jarocki, Jerzy Kostecki, Janusz Mikolajczyk, Rafal Rakowski, and Miroslaw Szczurek "Compact laser plasma EUV source based on a gas puff target for metrology", Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); https://doi.org/10.1117/12.482749
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Cited by 13 scholarly publications and 1 patent.
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KEYWORDS
Extreme ultraviolet

Plasma

Spectrometers

Xenon

X-rays

Nd:YAG lasers

Photodiodes

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